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The effect of an alkylsilane monoalyer on an indium-tinoxide surface on the electrochemistry of hexacyanoferrate

机译:烷基硅烷单醛在氧化铟锡表面上对六氰合铁酸盐电化学的影响

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摘要

The presence of a disorganized octadecylsilane, C_(18), monolayer onanindium-tin oxide (ITO) electrode has a profound effect onthe electrochemistry of hexacyanoferrate, Fe(CN)_6~(3-/4-). We found that the alkylsilane monolayer forms a hydrophobic matrix, which affects the heterogeneous rate of electrontransfer of the metallic complex, depending onthe nature of the counter cation presence in the solution. A model is suggested which accounts for these effects as well as for the changes in the formal redox potential that are observed.
机译:杂乱的十八烷基硅烷C_(18)单层氧化铟锡(ITO)电极的存在对六氰合铁酸盐Fe(CN)_6〜(3- / 4-)的电化学具有深远的影响。我们发现烷基硅烷单层形成疏水基质,这取决于溶液中抗衡阳离子存在的性质,从而影响金属络合物电子转移的异质速率。建议建立一个模型,该模型考虑到这些影响以及所观察到的形式氧化还原电位的变化。

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