Evaluation of corneal thickness using a Scheimpflug-Placido disk corneal analyzer and comparison with ultrasound pachymetry in eyes after laser in situ keratomileusis

摘要

Purpose: To evaluate the repeatability and reproducibility of corneal thickness measurements in post-laser in situ keratomileusis (LASIK) eyes using a rotating Scheimpflug camera combined with a Placido disk corneal topographer (Sirius) and compare the results with those of ultrasound (US) pachymetry. Setting: Eye Hospital of Wenzhou Medical College, Wenzhou, China. Design: Comparative evaluation of a diagnostic test or technology. Methods: Patients were examined 3 times with the Scheimpflug-Placido topographer by 2 examiners. The central pupil corneal thickness (CTpupil), apical corneal thickness (CTapex), and thinnest corneal thickness (CT thinnest) were recorded. After noncontact examinations, US pachymetry was used to obtain the central corneal thickness (CCT). Results: The Scheimpflug-Placido topographer showed high intraoperator repeatability as indicated by a test-retest repeatability of less than 8.5 μm for CT pupil, CTapex, and CTthinnest, The coefficients of variation (CoV) were less than 0.7%, and the intraclass correlation coefficient was higher than 0.99. Excellent results were also obtained for interoperator reproducibility. All CoVs were less than 0.5%. The 95% limits of agreement between the Scheimpflug-Placido measurement and the US pachymetry measurements were narrow (-16.62 to 12.44 μm for CTpupil versus US pachymetry CCT; -17.49 to 12.16 μm for CTapex versus US pachymetry CCT; -18.59 to 10.90 μm for CTthinnest versus US pachymetry CCT). Conclusions: The Scheimpflug-Placido topographer showed excellent intraoperator repeatability and interoperator reproducibility of CTpupil, CTapex, and CTthinnest measurements in post-LASIK eyes. The CCT measurements obtained using the device were in high agreement with those obtained by US pachymetry, suggesting that the 2 devices are interchangeable. Financial Disclosure: No author has a financial or proprietary interest in any material or method mentioned.