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In situ FTIR and XANES studies of thiophene hydrodesulfurization on Ni_2P/MCM-41

机译:Ni_2P / MCM-41对噻吩加氢脱硫的原位FTIR和XANES研究

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The hydrodesulfurization (HDS) of thiophene was studied over Ni_2P/MCM-41 by in situ Fourier transform infrared (FTIR) spectroscopy and X-ray absorption near-edge structure (XANES) measurements at atmospheric pressure and 393-723 K (120-450°C). FTIR showed the presence of adsorbed molecular thiophene principally on the MCM-41 support. In the presence of hydrogen new bands in the aliphatic C-H stretching region (2953, 2918, and 2876 cm~(-1)) and the CH_2 scissoring region (1464 cm~(-1)) appeared and grew with temperature up to 553 K (280°C). These were assigned to a tetrahydrothiophene surface intermediate, whose presence is consistent with the high hydrogenation activity of nickel phosphide. XANES measurements between 353 and 573 K (180-300°C) also showed growth of a signal (8330.9 eV) attributed to Ni-S interactions of either the adsorbed tetrahydrothiophene or a surface phosphosulfide. Transient XANES measurements showed that the sulfur species responded dynamically at the same rate as the steady-state rate, indicating that it was associated with an intermediate in the reaction.
机译:在大气压和393-723 K(120-450)下,通过Ni_2P / MCM-41的原位傅立叶变换红外光谱(FTIR)和X射线吸收近缘结构(XANES)测量研究了噻吩的加氢脱硫(HDS)。 °C)。 FTIR显示主要在MCM-41载体上存在吸附的分子噻吩的存在。在存在氢的情况下,脂肪族CH拉伸区(2953、2918和2876 cm〜(-1))和CH_2剪切区(1464 cm〜(-1))出现了新的带,并在高达553 K的温度下生长。 (280℃)。将它们分配给四氢噻吩表面中间体,该中间体的存在与磷化镍的高氢化活性相一致。 353和573 K(180-300°C)之间的XANES测量结果还显示信号的增长(8330.9 eV)归因于吸附的四氢噻吩或表面磷硫化物的Ni-S相互作用。瞬态XANES测量表明,硫物质以与稳态速率相同的速率动态响应,表明它与反应中的中间体有关。

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