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首页> 外文期刊>Journal of Chemical Engineering of Japan >Residual Stress Behavior of Polyimide Thin Films:Effect of Precursors
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Residual Stress Behavior of Polyimide Thin Films:Effect of Precursors

机译:聚酰亚胺薄膜的残余应力行为:前体的影响

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The two different types of precursors,poly(amic acid)and polyisoimide,were prepared from 4,4'-(l,4-phenylenebis(l-methylethylidene))bisbenzenamine and 4-4'-oxydiphthaIic anhydride for synthesis of polyimides.The FTIR spectroscopy was used to investigate the imidization reaction progress of poly(amic acid)and polyisoimide.Thermal properties were investigated using DSC and TGA.Stress behaviors during and after imidization processes of the two precursors were analyzed and compared using a bending beam curvature measurement system equipped with an in situ film thickness measurement system,the interferometer.The stress behaviors were significantly affected by the types of precursors,as water molecules evolved during the imidization process of poly(amic acid),being different from polyisoimide.They were also affected by temperature scanning rate for imidization and the annealing process.
机译:分别从4,4'-(1,4-亚苯基双(1-甲基亚乙基))双苯甲胺和4-4'-氧二苯酐制备了两种不同类型的前体聚酰胺酸和聚异酰亚胺,用于合成聚酰亚胺。 FTIR光谱法研究了聚(酰胺酸)和聚异酰亚胺的酰亚胺化反应过程,用DSC和TGA研究了热性质,分析了两种前体在酰亚胺化过程中和之后的应力行为,并通过弯曲束曲率测量系统进行了比较。应力行为受前驱物类型的影响很大,因为水分子在聚酰胺酸的酰亚胺化过程中会演化,不同于聚异酰亚胺。它们也受到前驱物类型的影响。用于酰亚胺化的温度扫描速率和退火过程。

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