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Investigation of properties of electric arc ion deposited TiN coating on Al_2O_3-based ceramic composite

机译:Al_2O_3基陶瓷复合材料上电弧离子沉积TiN涂层的性能研究

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摘要

Electric arc ion deposition technique was adopted to deposit TiN coating on Al_2O_3-based ceramic composite. Scanning electron microscopy and secondary ion mass spectrometry were used to analyze the microstructure, phase constitution, and quality of the TiN coating and the interface. Surface roughness and micro-hardness of the TiN coating were measured to evaluate its quality. Flexural strength of ceramic materials is dependent on both their inherent resistance to fracture and the presence of defects, thus it was used to investigate the effect of electric arc ion deposition technique on the surface modification of Al_2O_3-based ceramic composite. Experimental results show that the higher the deposition bias voltage, the better the coating quality The TiN coating is homogeneous, with a uniform surface, and free of defects when the deposition bias voltage is 300 V. The TiN coating strongly adheres to the Al_2O_3-based ceramic composite, and the observed elemental interface diffusion strengthens the interface bonding.
机译:采用电弧离子沉积技术在Al_2O_3基陶瓷复合材料上沉积TiN涂层。使用扫描电子显微镜和二次离子质谱法分析了TiN涂层和界面的微观结构,相组成和质量。测量TiN涂层的表面粗糙度和显微硬度,以评估其质量。陶瓷材料的抗弯强度取决于其固有的抗断裂性和缺陷的存在,因此被用来研究电弧离子沉积技术对Al_2O_3基陶瓷复合材料表面改性的影响。实验结果表明,沉积偏压越高,涂层质量越好。TiN涂层均匀,表面均匀,当沉积偏压为300 V时无缺陷。TiN涂层牢固地附着在Al_2O_3-基上陶瓷复合材料,观察到的元素界面扩散增强了界面结合。

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