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Influences of copper roughness on the electrical and mechanical performances of embedded capacitance materials

机译:铜粗糙度对嵌入式电容材料的电气和机械性能的影响

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摘要

In this letter, the influences of copper roughness on the electrical and mechanical properties of embedded capacitance materials (ECMs) are investigated. The very low-profile ECM (VLP-ECM) is found having a capacitance of 1.24nF/cm(2) with the lowest tolerance of 5.5% (1x1mm). In contrast, the rolled anneal ECM has a higher tolerance, and invalid embedded capacitors are even found in the electrodeposited ECM. The VLP-ECM is also found having the highest peel strength of 10.2N/cm among the three ECM. The appropriate copper roughness (R(z)3.5m) is beneficial for getting a uniform coating for the restriction of the flowing of BaTiO3/epoxy composite. And the hook functioned copper bulges can increase the contacting area against stripping. Therefore, the ECM fabricated with VLP copper foil has the best electrical and mechanical performances, which is favored in the application of printed circuit boards manufacturing.
机译:在这封信中,研究了铜粗糙度对嵌入式电容材料(ECM)的电气和机械性能的影响。发现超薄型ECM(VLP-ECM)的电容为1.24nF / cm(2),最低容差为5.5%(1x1mm)。相比之下,轧制退火ECM具有更高的公差,甚至在电沉积ECM中也发现了无效的嵌入式电容器。在三个ECM中,还发现VLP-ECM的剥离强度最高,为10.2N / cm。适当的铜粗糙度(R(z)3.5m)有利于获得均匀的涂层,以限制BaTiO3 /环氧树脂复合材料的流动。带有挂钩功能的铜凸起可增加防止剥落的接触面积。因此,用VLP铜箔制成的ECM具有最佳的电气和机械性能,在印刷电路板制造应用中受到青睐。

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