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Superhydrophobic Coatings for Microdevices

机译:微型设备用超疏水涂料

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摘要

We have developed two simple techniques to impart superhydrophobic properties to the surfaces of microdevices. In the first approach, thin films of a fluoropolymer were spin-coated on the device surfaces followed by an oxygen plasma treatment. By varying the oxygen plasma treatment time, the water contact angles on device surface could be tuned from 120° to 169°. In the second approach, a nanoimprint process was used to create nanostructures on the devices. To fabricate nanoimprint stamps with various feature sizes, nanosphere lithography was employed to produce a monolayer of well-ordered close-packed nanoparticle array on the silicon surfaces. After oxygen plasma trimming, metal deposition and dry etching process, silicon stamps with different nanostructures were obtained. These stamps were used to imprint nanostructures on hydrophobic coatings, such as Teflon, over the device surfaces. The water contact angle as high as 167° was obtained by the second approach.
机译:我们已经开发出两种简单的技术来赋予微型设备表面超疏水性。在第一种方法中,将含氟聚合物薄膜旋涂在设备表面,然后进行氧等离子体处理。通过改变氧等离子体处理时间,可以将设备表面的水接触角从120°调整到169°。在第二种方法中,使用纳米压印工艺在设备上创建纳米结构。为了制造具有各种特征尺寸的纳米压印印模,采用纳米球体光刻技术在硅表面上生产出排列整齐,密排的纳米颗粒阵列的单层。经过氧等离子体修整,金属沉积和干法蚀刻工艺后,获得了具有不同纳米结构的硅印模。这些压模用于将纳米结构压印在器件表面上方的疏水涂层(例如Teflon)上。通过第二种方法获得了高达167°的水接触角。

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