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Synthesis of polyimides containing pyridine or triazole moiety to improve their adhesion to sputter-deposited copper

机译:包含吡啶或三唑部分的聚酰亚胺的合成,以提高其对溅射沉积铜的附着力

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Polyimides containing pyridine as well as triazole were synthesized.The incorporation of pyridine or triazole improves the adhesion between polyimides and sputter-deposited copper.4,4'-oxydianiline(ODA)was separately mixed with 2,6-diaminopyridine(DAP)and 3,5-diamino-1,2,4-triazole(DATA),to form co-diamines.A series of polyimides was obtained in two steps by reacting co-diamines and 3,3',4,4'-pyromellitic dianhydride(PMDA).The structure of the polyimides was verified by Fourier Transform Infrared spectroscopy(FT-IR)and Nuclear Magnetic Resonance(NMR).Their thermal,mechanical and dielectric properties were investigated.The rigidity of both pyridine and triazole moieties influences the coefficient of thermal expansion,the tensile strength and the elastic modulus of the films.The adhesion strength of the sputter-deposited copper to polyimide films was proportional to the functional group content.At a molar ratio of DAP to ODA of 1:6,the 90deg-peel strength of copper/polyimide laminates reached a maximum of 990 J/m2.At a molar ratio of DATA to ODA of 1:6,the 90deg-peel strength of copper/polyimide laminates reached a maximum of 696 J/m2.The corresponding polyimide films exhibited a good balance in thermal,mechanical and dielectric properties,as did the PMDA-ODA film.The locus of failure(LOF)examination by X-ray photoelectron spectroscopy(XPS)indicated that the LOF of laminates with low to moderate adhesion was mostly at the interface near the polyimide;the LOF of laminates with high adhesion was mostly in the polyimide.The N_(1s)core level spectra of the delaminated copper surface revealed a peak at 398.4 eV in copper/polyimide with DAP/ODA ratio of 1:6 and a peak at 398 eV in copper/polyimide with DATA/ODA ratio of 1:6,perhaps due to the formation of N-Cu charge-transfer complex.This complex substantially promoted the adhesion between sputter-deposited copper and polyimides.
机译:合成了含有吡啶和三唑的聚酰亚胺,吡啶或三唑的掺入提高了聚酰亚胺与溅射沉积铜之间的附着力.4,4'-氧二苯胺(ODA)分别与2,6-二氨基吡啶(DAP)和3 ,5-二氨基-1,2,4-三唑(DATA)形成共二胺。通过使二胺与3,3',4,4'-均苯四甲酸二酐(聚酰亚胺的结构通过傅立叶变换红外光谱(FT-IR)和核磁共振(NMR)进行了验证,研究了它们的热,机械和介电性能。吡啶和三唑部分的刚度均会影响聚酰亚胺的系数热扩散,薄膜的拉伸强度和弹性模量。溅射沉积铜与聚酰亚胺薄膜的粘附强度与官能团含量成正比。在DAP与ODA的摩尔比为1:6时,90度铜/聚酰亚胺层压板的剥离强度最高可达990 J / m2。在DATA与ODA的摩尔比为1:6的情况下,铜/聚酰亚胺层压板的90度剥离强度达到最大值696 J / m2。相应的聚酰亚胺薄膜表现出良好的平衡。热,机械和介电性能,与PMDA-ODA膜一样。通过X射线光电子能谱(XPS)检验的失效点(LOF)表明,低至中度粘合力的层压板的LOF大部分位于表面附近。聚酰亚胺;高粘附性层压板的LOF大部分在聚酰亚胺中。分层的铜表面的N_(1s)核心能级谱显示,铜/聚酰亚胺中的DAP / ODA比为1:6的峰值为398.4 eV,并且有一个峰值在398 eV时,铜/聚酰亚胺的DATA / ODA比为1:6,这可能是由于形成了N-Cu电荷转移络合物。该络合物大大促进了溅射沉积的铜与聚酰亚胺之间的粘附。

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