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首页> 外文期刊>Journal of Applied Mechanics: Transactions of the ASME >Thermomechanical Analysis of Film-on-Substrate System With Temperature-Dependent Properties
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Thermomechanical Analysis of Film-on-Substrate System With Temperature-Dependent Properties

机译:随温度变化特性的基膜系统的热力学分析

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摘要

Thermomechanical analysis of global and local buckling is presented to show temperature effects on the stress/strain and shape of a film-on-substrate system. First, the strain is expressed as a function of three key temperatures (room, working, and deposit temperatures). Through sensitivity analysis on temperature, polydimethylsiloxane (PDMS) selection is determined to theoretically design film-on-substrate systems with the minimum variation in stress caused by temperatures. Then, the wrinkling behaviors are studied to establish the relationships of critical strain, wavelength, and amplitude with temperature. In addition, the critical working temperature is determined for local buckling. The approximate semi-analytical solution and the finite element simulation are compared by the use of a two-dimensional case of film on a half-space substrate.
机译:提出了整体和局部屈曲的热力学分析,以显示温度对基膜系统的应力/应变和形状的影响。首先,应变表示为三个关键温度(室温,工作温度和沉积温度)的函数。通过对温度的敏感性分析,确定了聚二甲基硅氧烷(PDMS)的选择,以在理论上设计出温度引起的应力变化最小的基膜系统。然后,研究起皱行为以建立临界应变,波长和幅度与温度的关系。另外,确定临界工作温度以进行局部屈曲。通过在半空间基板上使用薄膜的二维情况,比较了近似的半解析解和有限元模拟。

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