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Electrochemical deposition of Co-Sb thin films on nanostructured gold

机译:Co-Sb薄膜在纳米结构金上的电化学沉积

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摘要

The electrochemical behavior of the Co-Sb system on Au substrate during cyclic voltammetry and potentiostatic deposition was investigated. Electrochemical behavior of Co and Sb was studied and compared to the Co-Sb system. At a negative potential (-0.9 V vs. Ag/AgCl) the electrochemical behavior of this binary system was similar to that of individual Co and Sb combined. For more negative vertex potentials (e.g.,-1.2 V vs. Ag/AgCl), results from cyclic voltammetry have shown the presence of a new compound different from Co and Sb which could only be detected at slow sweep rate. The deposition performed at constant potentials between-1.0 and-1.2 V have resulted in films that were made of CoSb3 and Sb as indicated by XRD. Surface film studied by SEM and EDS has shown morphological and compositional nonuniformities caused by hydrogen evolution.
机译:研究了Co-Sb体系在Au基体上的循环伏安和恒电位沉积过程中的电化学行为。研究了Co和Sb的电化学行为,并将其与Co-Sb系统进行了比较。在负电势(-0.9 V对Ag / AgCl)下,该二元体系的电化学行为类似于单独的Co和Sb的电化学行为。对于更多的负顶点电势(例如,-1.2 V对Ag / AgCl),循环伏安法的结果表明存在不同于Co和Sb的新化合物,该化合物只能在缓慢扫描速率下才能检测到。如XRD所示,在-1.0至-1.2 V的恒定电势下进行的沉积已形成由CoSb3和Sb制成的薄膜。通过SEM和EDS研究的表面膜显示出由氢逸出引起的形态和组成不均匀性。

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