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首页> 外文期刊>Journal of Applied Electrochemistry >Chromium electrodeposition from [BMIm][BF4] ionic liquid
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Chromium electrodeposition from [BMIm][BF4] ionic liquid

机译:[BMIm] [BF4]离子液体中的铬电沉积

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The electrodeposition of black chromium coatings from ionic liquid 1-butyl-3-methylimidazolium tetrafluoroborate with chromium chloride, and the chemical composition of the deposits are discussed in this article. The UV-Vis spectra recorded for chromium(III) species in 1-butyl-3-methylimidazolium tetrafluoroborate suggest that along with the chromium(III) complexes containing three ligands, there are some amounts of chromium species containing four ligands in the bath employed. The cathodic process of chromium electrodeposition in the employed ionic liquid is complicated by the electrochemical reduction of water molecules, which is followed by chemical disintegration of tetrafluoroborate ions. The surface morphology of black chromium films deposited potentiostatically (-1.5 to -2.0 V) at 85 °C shows nodules and microcracks increasing in size with cathodic potential. Analysis of the X-ray photoelectron spectra recorded from surface to depth of the deposit has shown that the black oxide-rich chromium coating consists of chromium in both oxide and metallic states with small impurities of other elements (fluorine, boron, carbon and nitrogen) and the surface is covered with a thin layer of organic substances. The results of this study show that 1-butyl-3-methylimidazolium tetrafluoroborate may be considered as a promising substitute of toxic Cr(VI) baths for black chromium plating.
机译:本文讨论了离子液体四氟硼酸1-丁基-3-甲基咪唑鎓四氟硼酸盐与氯化铬的黑色铬涂层的电沉积,以及沉积物的化学组成。记录的四氟硼酸1-丁基-3-甲基咪唑鎓中的铬(III)物种的UV-Vis光谱表明,与含有三个配体的铬(III)配合物一起,在所使用的镀液中也存在一些含有四个配体的铬物种。所用离子液体中铬电沉积的阴极过程由于水分子的电化学还原而变得复杂,随后四氟硼酸根离子发生化学分解。在85°C恒电位(-1.5至-2.0 V)下沉积的黑铬膜的表面形态显示,结节和微裂纹的尺寸随着阴极电位的增加而增加。从沉积物的表面到深度记录的X射线光电子能谱分析表明,富含黑色氧化物的铬涂层由处于氧化物态和金属态的铬以及少量其他杂质(氟,硼,碳和氮)组成并且表面覆盖了一层薄薄的有机物质。这项研究的结果表明,1-丁基-3-甲基咪唑鎓四氟硼酸盐可能被认为是有毒的铬(VI)镀铬的有希望的替代品。

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