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首页> 外文期刊>Journal de Physique, IV: Proceedings of International Conference >Ordered mesoporous silica and alumina thin films studied by X-ray scattering
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Ordered mesoporous silica and alumina thin films studied by X-ray scattering

机译:X射线散射研究的有序介孔二氧化硅和氧化铝薄膜

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摘要

The use of X-ray techniques for the characterisation of ordered mesoporous films is demonstrated. Both silica and alumina thin layers with an ordered mesoporosity are studied using low-angle diffraction and grazing incidence reflectometry. It is shown how the internal structure evolves upon drying and how texture can be easily detected using a two-circle diffractometer. The reflectometry data are correlated with results from nitrogen adsorption/desorption experiments.
机译:证明了使用X射线技术表征有序介孔薄膜。使用低角度衍射和掠入射反射法研究了有序介孔率的二氧化硅和氧化铝薄层。它显示了内部结构在干燥后如何演变以及如何使用两圆衍射仪轻松检测质地。反射数据与氮吸附/解吸实验的结果相关。

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