In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings

摘要

With filtered pulsed arc discharge (FPAD) method it is possible to achieve very high adhesion of high quality diamond-like carbon (DLC). Here we explain this high adhesion with the oxide reduction and consequent carbide formation and ion mixing of the substrate when exposed to high temperature carbon plasma ions. The use of intensive high energy (>2 keV) carbon plasma is the only practical method to achieve ultimate adhesion of DLC. With this unique method presented, the adhesion properties and the substrate interface electron spectroscopy for chemical analysis (ESCA) spectra of DLC coatings are independent of the pre-treatment of silicon substrates. High adhesion and proper selection of substrate enables to deposit thick DLC coatings (>10 mu m). We also show how the DLC deposition system can be improved and simplified.