Diamond deposition in a DC-arc Jet CVD system: investigations of the effects of nitrogen addition

摘要

Studies of the chemical vapour deposition of diamond films at growth rates >100#mu#m h~(-1) with a 10-kW DC-arc jet system are described. Additions of small amounts of N_2 to the standard CH_4/H_2/Ar feedstock gas results in strong CN(B-> X) emission, and quenches C_2(d->a) and H_(#alpha#) emissions from the plasma. Species selective, spatially resolved optical emission measurements have enabled derivation of the longitudinal and lateral variation of emitting C_2, CN radicals and H (n=3) atoms within the plasma jet. Scanning electron microscopy and laser Raman analyses indicate that N_2 additions also degrade both the growth rate and quality of the deposited diamond film; the latter technique also provides some evidence for nitrogen inclusion within the films.