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Comparision of field electron emission from DLC films produced by four different deposition techniques

机译:比较四种不同沉积技术产生的DLC薄膜的场电子发射

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摘要

Diamond-like carbon (DLC) films produced by ion beam, laser-arc, r.f.-plasma deposition andmagnetron sputtering were characterized on the field electron emission properties (thresholds,hysteresis behaviour, stability, homogeneity). The best samples showed electron emission at fields of4-20 Vμm{sup}-1. Correlations between emission properties and film hardness, Raman spectra,optical band gap, sp{sup}3-bonded carbon content and electroconductivity were found. A speciallydesigned high vacuum scanning tunneling-field emission microscope was used for simultaneousmapping of film morphology, work function and local field emission intensity. Correlations wereobserved between emission centres location and work function minima. Factors that improve thefield electron emission from DLC films are discussed.
机译:通过离子束,激光电弧,射频等离子体沉积和磁控溅射制备的类金刚石碳(DLC)膜具有场电子发射特性(阈值,磁滞行为,稳定性,均匀性)。最好的样品在4-20Vμm{sup} -1的场中显示出电子发射。发现了发射性能与薄膜硬度,拉曼光谱,光学带隙,sp {sup} 3-键碳含量和电导率之间的相关性。使用专门设计的高真空扫描隧道场发射显微镜同时映射膜的形态,功函数和局部场发射强度。观察到排放中心的位置与最小功函数之间的相关性。讨论了改善DLC薄膜的场电子发射的因素。

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