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Characterization of phosphorus doped CVD diamond films by cathodoluminescence spectroscopy and topography

机译:阴极荧光光谱和形貌表征磷掺杂的CVD金刚石膜

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摘要

A phosphorus doped homoepitaxial diamond film made by a CVD method was investigated by cathodoluminescence spectroscopy and topography. An exciton peak bound to phosphorus at 239 nm was observed from {001} as well as {111}, but the wavelength and width of the peak varied depending on location of the sample. This may be due to the difference of crystal perfection. It was found in the spectra that the slope with an array of weak peaks has a maximum of approximately 270 nm. This broad band may be an indicator of incororation of phosphorus, although all the phosphorus doped diamonds do not exhbit the band. No other peak expected to be related to phosphorus was found, but several peaks commonly observed from CVD diamond were seen instead. These were also dependent on growth surface. Peaks at 415, 482, 500, 514 and 532 nm were strong on {111} surfaces of the non-epitaxial crystallinites, whereas teh 575-nm peak and another system of the 532-nm peaks were stronger in {001} epitaxial layers, as reported earlier.
机译:通过阴极发光光谱法和形貌研究了通过CVD法制得的掺磷的同质外延金刚石膜。从{001}和{111}中观察到在239nm处与磷结合的激子峰,但是该峰的波长和宽度根据样品的位置而变化。这可能是由于晶体完美度的差异。在光谱中发现,具有一系列弱峰的斜率的最大值约为270 nm。尽管所有掺杂磷的钻石都没有排除该频带,但该宽带可能指示磷的配位。没有发现其他可能与磷有关的峰,但是可以看到通常在CVD金刚石中观察到的几个峰。这些也取决于生长表面。非外延晶体的{111}表面上的415、482、500、514和532 nm处的峰很强,而{001}外延层中的575 nm峰和532 nm峰的另一种体系更强,如前所述。

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