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Temperature dependent spectroscopic study of the electronic structure of phosphorus in-type CVD diamond films

机译:磷中型CVD金刚石薄膜电子结构的温度依赖性光谱研究

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In this work we used the quasi-steady-state photocurrent method and photothermal ionisation spectroscopy (PTIS) to study the electronic structure of the P-related level in n-type phosphorus doped CVD diamond. Previously, we reported the existence of two optically active defect levels, labelled X{sub}(P1) and X{sub}(P2) in the bandgap of these P-doped layers. X{sub}(P2) appeared to be only present in films showing high resistivity. Here we present a detailed PTIS and photocurrent study of the photoionisation cross-section, from liquid helium up to room temperature. At low temperatures, samples containing only the X{sub}(P1) defect show a phonon-induced oscillatory photoconductivity giving information about the electronic structure of this defect. Additionally, with PTIS a sharp maximum was detected around 565 meV, originating from a thermal promotion of charge carriers from an excited state of the phosphorus-related level into the conduction band. We also discuss different models for the optical ionisation cross-section of the P-related level (e.g. shallow level deep level).
机译:在这项工作中,我们使用准稳态光电流方法和光热电离光谱(PTIS)研究了n型磷掺杂CVD金刚石中P相关能级的电子结构。以前,我们报道了在这些P掺杂层的带隙中存在两个旋光缺陷水平,分别标记为X {sub}(P1)和X {sub}(P2)。 X {sub}(P2)似乎仅存在于显示高电阻率的薄膜中。在这里,我们介绍了从液氦到室温的光电离截面的详细PTIS和光电流研究。在低温下,仅包含X {sub}(P1)缺陷的样品显示出声子诱导的振荡光电导性,从而给出了有关该缺陷的电子结构的信息。此外,利用PTIS,在565 meV附近检测到一个急剧的最大值,这是由于载流子从磷相关能级的激发态到导带的热促进而产生的。我们还讨论了P相关能级(例如浅能级深能级)的光学电离截面的不同模型。

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