Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system

摘要

The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was operated in constant average current mode and in a mixture of argon and oxygen or only in pure argon working gas. A titanium nozzle served as the hollow cathode. The total energy flux density measurements were made using a planar calorimeter probe. The main results from the calorimeter probe showed clearly that the total energy flux density at the electrically isolated substrate decreases significantly with duty cycle from 100% (DC mode) to 10% at a given pulsing frequency 2.5 kHz. A local maximum at duty cycle 60% for only pure argon operation has been observed. In addition, the voltage waveforms on the hollow cathode and before the ballast resistor have been saved for pulsed DC measurements for both pure argon and argon + oxygen mixture. A similar transient phenomenon on the cathode voltage and discharge current as observed recently in mid-frequency pulsed DC magnetron discharge has been discovered in the hollow cathode plasma jet sputtering system. We can conclude from these preliminary measurements that the main asset of the pulsed DC hollow cathode plasma jet discharge as distinct from the DC driving of the same plasma system lies in the possibility to reduce or to increase energy influx on the floating substrate within the change of duty cycle. (C) 2008 Elsevier Ltd. All rights reserved.