首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >RELATIONSHIP BETWEEN THE RESIDUAL GAS PRESSURE AND THE LOWEST TEMPERATURE KEEPING METAL SURFACES ESSENTIALLY CLEAN IN HIGH VACUA
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RELATIONSHIP BETWEEN THE RESIDUAL GAS PRESSURE AND THE LOWEST TEMPERATURE KEEPING METAL SURFACES ESSENTIALLY CLEAN IN HIGH VACUA

机译:高真空度下残余气体压力与最低温度保持基本清洁的金属表面之间的关系

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摘要

Effective work functions for thermal positive ionic and electronic emissions from heated metal surfaces were measured, from the data on which the lowest surface temperatures (T*) keeping each surface atomically clean were determined to be about 1990, 1970 and 1710 K for Mo, Wand Re, respectively, in the residual gas pressure (P) of about 2 x 10(-5) Pa The data obtained with Re at P approximate to 10(-5)-10(-3) Pa yielded T* = 2820+241 log P. [References: 5]
机译:根据数据确定了保持金属表面原子清洁的最低表面温度(T *),得出Mo,Wand的最低表面温度(T *)约为1990、1970和1710 K分别在大约2 x 10(-5)Pa的残余气体压力(P)时的Re值。Re在P处大约为10(-5)-10(-3)Pa时获得的数据产生T * = 2820 + 241 logP。[参考:5]

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