首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Optical emission kinetics of argon inductively coupled plasma and argon dielectric barrier discharge
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Optical emission kinetics of argon inductively coupled plasma and argon dielectric barrier discharge

机译:氩感应耦合等离子体的光发射动力学和氩介电势垒放电

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摘要

An experimental setup has been built up to create radio frequency (RF) inductively coupled plasma (ICP) and dielectric barrier discharge (DBD), and to investigate the kinetics of the deposition of diamond like carbon films. Optical emission spectra in visible and near ultraviolet region from argon ICP and DBD plasmas created in the machine were measured to analyze their optical emission kinetics. For ICP plasma of argon, the higher RF power input (higher than 500 W for our machine), the stronger ion optical emission strength. But the atom optical emission strength does not get higher the increase of the power input. On the otherwise, the optical emission kinetics of argon DBD discharge behaves in manner of unipolar pulsed discharge. DBD current is composed of a series of breakdown pulses equally spaced in temporal domain. The kinetics of DBD optical emission strength is mainly governed by the DC breakdown voltage of the used gas and therefore by the density of the breakdown current pulse. (C) 2002 Elsevier Science Ltd. All rights reserved. [References: 13]
机译:建立了一个实验装置,以创建射频(RF)电感耦合等离子体(ICP)和介电势垒放电(DBD),并研究类金刚石碳膜沉积的动力学。测量了机器中产生的氩ICP和DBD等离子体在可见光和近紫外区域的发射光谱,以分析它们的发射动力学。对于氩的ICP等离子体,RF功率输入越高(对于我们的机器,该功率大于500 W),离子的光发射强度就越强。但是原子的光发射强度不会随着功率输入的增加而变高。否则,氩DBD放电的光发射动力学以单极脉冲放电的方式表现。 DBD电流由一系列击穿脉冲组成,这些击穿脉冲在时域中均等分布。 DBD光发射强度的动力学主要取决于所用气体的直流击穿电压,因此也取决于击穿电流脉冲的密度。 (C)2002 Elsevier ScienceLtd。保留所有权利。 [参考:13]

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