The Closed Field Un-Balanced Magnetron Sputter Ion Plating (CFUBMSIP) process is now routinely used in a production environment and is characterised by a high degree of flexibility in terms of. the substrates and coating materials which can beused. Compared to classical magnetron sputtering the d6sttl field system produces higher ion current density which gives high quality coatings and excellent adhesion. The ability to vary the deposition parameters over a wide range, permits themodification of not only the composition and the structure but also the morphology (density and growth mode) of the films. This paper describes, that in particular, a range of carbon coatings from transparent, electrically insulating to black. conductivecoatings. can be produced. Tribological tests concerning adherence hardness and wear properties in atmospheric and lubricated conditions are presented. The effects of the nature of the substrates with different hardness properties (M42, stainless steeland Al) are investigated.
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