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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Microstructure formation and evolution mechanism of Cu-Ti coating during dual-magnetron sputtering and thermo plasma nitriding
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Microstructure formation and evolution mechanism of Cu-Ti coating during dual-magnetron sputtering and thermo plasma nitriding

机译:双磁控溅射和热等离子体氮化过程中Cu-Ti涂层的组织形成及析出机理

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摘要

Dual magnetron sputtering and thermo plasma nitriding were performed to fabricate Cu-Ti-N coating on the surface of Cu substrate, and the microstructure formation and evolution mechanism were investigated. The results showed that the composition of the Cu-Ti coating could be tuned to be around Cu:Ti = 1:1.2 by the appropriate choice of sputtering power for the dual targets, and only amorphous Cu Ti phases formed. During the thermo plasma nitriding process, crystalline CuTi and Cu3Ti occurred. Moreover, a nitride layer of about 0.3 mu m containing nanocrystalline TiN formed on the surface, and the multi-phase coating developed to be about 4 gm, which could provide better support for the nitrided layer. (C) 2016 Elsevier Ltd. All rights reserved.
机译:进行了双磁控溅射和热等离子体氮化在铜基体表面制备Cu-Ti-N涂层,并研究了其微观结构形成和演变机理。结果表明,通过适当选择双靶的溅射功率,可以将Cu-Ti涂层的组成调整为Cu:Ti = 1:1.2左右,并且仅形成非晶态的Cu Ti相。在热等离子体氮化过程中,出现了晶体CuTi和Cu3Ti。而且,在表面上形成了约0.3μm的包含纳米晶TiN的氮化物层,并且多相涂层发展为约4gm,这可以为氮化物层提供更好的支撑。 (C)2016 Elsevier Ltd.保留所有权利。

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