首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Effects of radio-frequency powers on the properties of carbon coatings on optical fibers prepared by thermal chemical vapor deposition enhanced with inductively coupled plasma
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Effects of radio-frequency powers on the properties of carbon coatings on optical fibers prepared by thermal chemical vapor deposition enhanced with inductively coupled plasma

机译:射频功率对通过电感耦合等离子体增强的热化学气相沉积制备的光纤上的碳涂层性能的影响

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This study investigates the effects of different radio-frequency (rf) powers on the characteristics of carbon coatings on optical fibers that are prepared by thermal chemical vapor deposition (thermal CVD) enhanced with inductively coupled plasma (ICP). Methane and nitrogen were used as the precursor gases, and rf-powers of ICP were set to 0, 50, 100, 200, 300, and 400 W. The deposition temperature, working pressure, and deposition time in the thermal CVD process were set to 1248 K, 4 kPa, and 2 h, respectively. Experimental results indicate that the deposition rate of carbon coatings increases as the rfpower increases from 0 to 200W, but decreases as the rf-power exceeds 200W. The mean crystallite size and ordered degree of carbon coatings decrease with increasing the deposition rate. Moreover, when the rf-power increases, the carbon coatings have more sp~2 carbon atoms and shift to graphite-like. With the assistance of ICP, carbon coatings can be deposited by thermal CVD at a low working pressure (about 4 kPa). Furthermore, the deposition rate and film properties can be adjusted by the rf-power.
机译:这项研究调查了不同的射频(rf)功率对光纤的碳涂层特性的影响,这些涂层是通过热化学气相沉积(thermal CVD)和感应耦合等离子体(ICP)增强而制备的。甲烷和氮气用作前驱气体,ICP的rf功率设置为0、50、100、200、300和400W。设置热CVD工艺中的沉积温度,工作压力和沉积时间分别达到1248 K,4 kPa和2 h。实验结果表明,碳涂层的沉积速率随着rfpower从0到200W的增加而增加,但是随着rfpower超过200W而降低。碳涂层的平均微晶尺寸和有序度随沉积速率的增加而减小。此外,当射频功率增加时,碳涂层具有更多的sp〜2碳原子,并转变为石墨状。借助ICP,可以通过热CVD在低工作压力(约4 kPa)下沉积碳涂层。此外,可以通过射频功率调节沉积速率和膜性质。

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