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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Study on multi-peak behavior of pulsed dielectric barrier discharges in atmospheric-pressure helium
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Study on multi-peak behavior of pulsed dielectric barrier discharges in atmospheric-pressure helium

机译:常压氦气中脉冲介电势垒放电的多峰行为研究

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In this work the multi-peak behavior of the dielectric barrier discharge excited by repetitive voltage pulses (pulsed DBD) in atmospheric-pressure helium has been systematically investigated, based on a one-dimensional fluid model. The effects of the parameters of the applied voltage pulse and dielectrics on the multi-peak behavior of the pulsed DBD have been analyzed in detail. The parameters of the applied voltage pulse include voltage growth rate, amplitude, pulse-width, and frequency. The parameters of dielectrics refer to relative permittivity and dielectric thickness. Under the given amplitude of the applied voltage pulse, the number of current pulses presents no monotonic decrease with increasing voltage growth rate, and the dependence of the amplitude of each current pulse on voltage growth rate is different. For a given voltage growth rate, the number of current pulses will increase with increasing applied voltage amplitude, but the amplitude of each current pulse does not vary. In addition, the increase of the pulse-width or the frequency can induce not only later appearance of current pulses and smaller amplitude of the last current pulse at the rising edge of the applied voltage pulse but also larger amplitude of the last current pulse at the falling edge of the applied voltage pulse. Also, the decrease of relative permittivity of the dielectric or the increase of dielectric thickness results in smaller discharge current density and shorter time of charging dielectrics, which may increase the number of current pulses.
机译:在这项工作中,基于一维流体模型,系统地研究了大气压氦气中重复电压脉冲(脉冲DBD)激发的电介质势垒放电的多峰行为。详细分析了施加的电压脉冲和电介质的参数对脉冲DBD的多峰行为的影响。施加的电压脉冲的参数包括电压增长率,幅度,脉冲宽度和频率。电介质的参数是指相对介电常数和电介质厚度。在给定的施加电压脉冲幅度的情况下,电流脉冲的数量不会随电压增长率的增加而单调减少,并且每个电流脉冲的幅度对电压增长率的依赖性也不同。对于给定的电压增长率,电流脉冲的数量将随着施加的电压幅度的增加而增加,但是每个电流脉冲的幅度都不会改变。另外,脉冲宽度或频率的增加不仅会导致电流脉冲的出现较晚,并且在施加的电压脉冲的上升沿处会导致最后一个电流脉冲的幅度较小,还会导致在施加电压脉冲时出现的最后一个电流脉冲幅度较大。施加电压脉冲的下降沿。而且,电介质的相对介电常数的降低或电介质厚度的增加导致较小的放电电流密度和较短的对电介质充电的时间,这可能增加电流脉冲的数量。

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