首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Xenon plasma as a potential source for EUV and soft X-ray radiations: Numerical experiments
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Xenon plasma as a potential source for EUV and soft X-ray radiations: Numerical experiments

机译:氙等离子体可作为EUV和软X射线辐射的潜在来源:数值实验

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The expected emission spectra of xenon plasma have been studied for different conditions using FLYCHK code. Expected xenon plasma spectra at certain electron temperature range have been plotted. The suitable electron temperature ranges for xenon plasma soft X-ray emission and extreme ultraviolet emission have been investigated. The X-ray ratio curves for various electron temperatures with probable electron and ion densities of the xenon plasma produced have been computed with the assumption of the non-local thermodynamic equilibrium model for the distribution of the ionic species. These ratio curves could be used for electron temperatures deduction of xenon plasma. Numerical experiments have been conducted on UNU/ICTP PF plasma focus device with Xe filling gas using Lee model. It shows and confirms the possibility of developing a UNU/ICTP PF plasma focus as a powerful EUV and X-ray radiation source simply by selecting the working gas pressure, choosing corresponding design and operating parameters of the device. We have illustrated that the results obtained from FLYCHK simulation can be used to provide spectroscopic information of the plasma focus simulated by using Lee model
机译:使用FLYCHK代码对氙气等离子体的预期发射光谱进行了研究。绘制了在某些电子温度范围内预期的氙等离子体光谱。已经研究了氙等离子体软X射线发射和极紫外发射的合适电子温度范围。在假设离子物种分布的非局部热力学平衡模型的假设下,计算了各种电子温度下X射线比率曲线以及所产生的氙等离子体的可能的电子和离子密度。这些比率曲线可用于氙等离子体的电子温度推导。使用Lee模型在带有Xe填充气体的UNU / ICTP PF等离子聚焦装置上进行了数值实验。它显示并确认仅通过选择工作气体压力,选择设备的相应设计和操作参数,就可以将UNU / ICTP PF等离子体聚焦开发为强大的EUV和X射线辐射源的可能性。我们已经说明了从FLYCHK模拟获得的结果可用于提供通过使用Lee模型模拟的等离子体焦点的光谱信息

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