Gold nanoparticles-attached NH _2 ~+ ion implanted silicon substrate: Preparation, characterization, and application in SERS (Conference Paper)

摘要

NH _2 ~+ ion implantation was performed at the energy of 80 keV with fluence of 2 × 10 ~(16) ions cm ~(-2) for silicon, and the implantation of amino groups on the silicon surface was verified by X-ray photoelectron spectroscopy (XPS) analysis. Well-defined gold nanoparticles (AuNPs) film was formed with a submonolayer coverage on the obtained NH _2 ~+ ion implanted silicon (NH _2/Si) surface, as revealed by the scanning electron microscopic (SEM) observations. Such AuNPs attached NH _2/Si (AuNPs/NH _2/Si) substrates showed a strong Surface-Enhanced Raman Scattering (SERS) effect, which enabled the detection of rhodanime 6G (R6G) at 10 ~(-11) M. NH _2 ~+ ion implantation appears to be a viable approach of preparing reproducible SERS substrates for sensitive Raman detection.