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首页> 外文期刊>WSEAS Transactions on Electronics >Snap-back characteristics tuning of SCR-based semiconductor structures
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Snap-back characteristics tuning of SCR-based semiconductor structures

机译:基于SCR的半导体结构的回弹特性调整

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摘要

Semiconductor structures having snap-back type of I-V characteristics are very useful in ESD (electrostatic discharge) protection design. ESD protection structures act as a protection of integrated circuits against the parasitic electrostatic discharge. The typical protection structure having the snap-back type of I-V characteristic is a SCR (silicon controlled rectifier) or a gate grounded NMOS transistor. This text is dealing with structures which enable tuning of I-V snapback characteristics. The simulated technology was CMOS very high voltage (VHVIC). The measurement was done for samples manufactured in 1.5μm BiCMOS.
机译:具有快速恢复型I-V特性的半导体结构在ESD(静电放电)保护设计中非常有用。 ESD保护结构可起到保护集成电路免受寄生静电放电的作用。具有I-V特性的反跳型的典型保护结构是SCR(可控硅)或栅极接地的NMOS晶体管。本文讨论的是能够调整I-V骤回特性的结构。模拟技术是CMOS超高压(VHVIC)。测量是在1.5μmBiCMOS中制造的样品进行的。

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