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首页> 外文期刊>High Temperature Material Processes >EVAPORATION OF ZIRCONIA IN AN INDUCTIVELY COUPLED PLASMA
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EVAPORATION OF ZIRCONIA IN AN INDUCTIVELY COUPLED PLASMA

机译:电感耦合等离子体中氧化锆的蒸发

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摘要

Inductively coupled plasma was studied to assess the feasibility of plasma flash evaporation of high-melting materials. The evaporation time of zirconia particles in thermal plasma of 10,000 K was estimated to be 90 and 560 (mu)s for spherical particles with radii of 5 and 12.5 (mu)m, respectively. Inductively coupled argon-hydrogen plasma was generated with a power of 30 kW at a frequency of 4 MHz. Its temperature as inferred from intensity ratios of spectral lines of singly ionized Zr amounted to between 7000 and 8600 K, depending on pressure, thus allowing for the existence of zirconia vapor. It was shown that by laser light scattering zirconia particles with a maximum diameter of 12 (mu)m could be vaporized at a rate of at least 200 mg/min, if the hydrogen fraction of the argon-hydrogen plasma was sufficiently high.
机译:对电感耦合等离子体进行了研究,以评估高熔点材料进行等离子体闪蒸的可行性。对于半径为5和12.5μm的球形颗粒,估计10,000 K的热等离子体中氧化锆颗粒的蒸发时间分别为90和560μs。以30 MHz的功率在4 MHz的频率下产生感应耦合的氩氢等离子体。由单离子化的Zr谱线的强度比推断的温度取决于压力,在7000和8600 K之间,因此存在氧化锆蒸气。结果表明,如果氩-氢等离子体的氢含量足够高,则通过激光散射,最大直径为12μm的氧化锆颗粒可以至少200 mg / min的速率蒸发。

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