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Coherent thermal radiation in thin films and its application in the emissivity design of multilayer films

机译:薄膜中的相干热辐射及其在多层膜发射率设计中的应用

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摘要

The infrared transmission spectra of a 0.54-mu m-thick Ge film and a 20-mu m-thick Si film were experimentally measured. As the incident radiation was in the wavelength range from 1.5 mu m to 10 mu m, the Ge film demonstrated a strongly spectral coherence. However, thermal radiation of the Ge film was found to be spatially incoherent due to its extreme thinness. The Si film exhibited significantly spectral and spatial coherence. The results confirmed that thermal radiation of a monolayer film could be coherent spectrally and spatially if the film thickness was comparable with the wavelength. The optical characteristic matrix method was applied to calculate the transmission spectra of the Si and Ge film, and the results agreed well with the measurements. This method was further used to analyze two multilayer films composed of five low emissive layers. Their emissivities were found to be highly emissive at a certain zenith angle, and the emissive peak could be controlled by careful selection of filmthickness.
机译:实验测量了0.54μm厚的Ge膜和20μm厚的Si膜的红外透射光谱。由于入射辐射的波长范围为1.5微米至10微米,Ge薄膜显示出很强的光谱相干性。然而,发现Ge膜的热辐射由于其极薄而在空间上是不连贯的。硅膜表现出明显的光谱和空间相干性。结果证实,如果膜厚度与波长可比,则单层膜的热辐射可以在光谱和空间上相干。采用光学特征矩阵法计算了Si和Ge膜的透射光谱,结果与测量结果吻合良好。该方法还用于分析由五个低发射层组成的两个多层膜。发现它们的发射率在一定的天顶角下是高度发射的,并且可以通过仔细选择膜厚来控制发射峰。

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