Structures and properties of Zr-N films prepared by ECR-microwave plasma source enhanced direct-current magnetron sputtering under different N-2 partial pressures

摘要

ZrN thin films were prepared on 45# steel by using ECR-microwave plasma source enhanced de magnetron sputtering. The increase of the N-2 partial pressure P-N2 leads to phase transitions from ZrN and an orthorhombic ZrN, phase to an amorphous phase. At P-N2 = 1.1 X 10(-2) Pa to 4.5 x 10(-2) Pa, the films contain both ZrN and ZrN. (a = 0.3585, b = 0.4443, c = 0.5798 nm). At P-N2 = 5.0 X 10(-2) Pa, the film shows a strong tendency towards the amorphous phase. The N concentration at different P-N2 varies from 7.73 to 66.96% according to electron probe analysis. The microhardness of the samples, varying from 19.82 GPa to 26.73 GPa, first increases and then decreases with increasing P-N2. The hardest sample has a wear rate of about 4.5 X 10(-5) mg/min. The property changes are relative to the film structure due to different N-2 partial pressures.