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首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >High-quality graphene on single crystal Ir(111) films on Si(111) wafers: Synthesis and multi-spectroscopic characterization
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High-quality graphene on single crystal Ir(111) films on Si(111) wafers: Synthesis and multi-spectroscopic characterization

机译:Si(111)晶片上的单晶Ir(111)膜上的高质量石墨烯:合成和多光谱表征

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The characterization of graphene by electron and optical spectroscopy is well established and has led to numerous breakthroughs in material science. Yet, it is interesting to note that these characterization methods are almost never carried out on the same sample, i.e., electron spectroscopy uses epitaxial graphene while optical spectroscopy relies on cleaved graphene flakes. In order to bring coherence and convergence to this branch, a universal and easy-to-prepare substrate is needed. Here we suggest that chemical vapour deposition (CVD) grown graphene on thin monocrystalline Ir(111) films, which are grown heteroepitaxially on Si(111) wafers with an yttria stabilized zirconia (YSZ) buffer layer, perfectly meets these needs. We investigate graphene prepared in this way by low-energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy, angle-resolved photoemission spectroscopy (ARPES), resonance Raman spectroscopy, and scanning tunnelling microscopy (STM). Our results highlight the excellent crystalline quality of graphene, comparable to graphene prepared on Ir(111) bulk single crystals.
机译:通过电子和光谱学对石墨烯的表征已得到充分确立,并导致了材料科学领域的众多突破。然而,有趣的是注意到这些表征方法几乎从未在同一样品上进行,即,电子光谱使用外延石墨烯,而光学光谱依赖于裂解的石墨烯薄片。为了使该分支具有连贯性和收敛性,需要一种通用且易于准备的基板。在这里,我们建议在具有氧化钇稳定氧化锆(YSZ)缓冲层的Si(111)晶片上异质外延生长的薄单晶Ir(111)膜上化学气相沉积(CVD)生长的石墨烯完全可以满足这些需求。我们研究通过低能电子衍射(LEED),X射线光电子能谱(XPS),近边缘X射线吸收精细结构(NEXAFS)光谱,角分辨光发射光谱(ARPES),共振拉曼光谱以这种方式制备的石墨烯光谱学和扫描隧道显微镜(STM)。我们的结果突出了石墨烯的优异结晶质量,可与在Ir(111)块状单晶上制备的石墨烯相媲美。

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