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Three-Dimensional Finite Element Analysis of the Stress Distribution at the Internal Implant-Abutment Connection

机译:种植体-基台内部连接处应力分布的三维有限元分析

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摘要

This study investigated stress distribution in four different implant-abutment interface conditions in the internal tapered connection implant system. Four different implant diameters (3.5 mm, 4.0 mm, 4.5 mm, and 5.0 mm) and two abutment types (hexagonal and conical) were simulated. Four unique implant-abutment interface conditions were assumed based on wall thickness, mating surface length, distance to the vertical stop, and abutment shape. Axial and oblique loading was applied during abutment screw preload, and the Von Mises stresses were measured at the implant-abutment and abutment-screw interfaces. The implant-abutment interface stress decreased as the wall thickness increased. As the mating surface increased, the stress distribution trended downward, and when the distance to the implant vertical stop was 0 mu m, the Von Mises stress was extremely high at the vertical stop. Despite their different shapes, the abutments showed similar stress distributions. However, the maximum Von Mises stress was higher in the conical connection than in the hexagonal connection, particularly at the contralateral side to loading. To decrease the stress distribution at the implant-abutment interface, the implant wall thickness, mating surface contact length, distance to the vertical stop, and abutment shape should be carefully considered.
机译:这项研究调查了内部锥形连接种植体系统中四种不同种植体-基台界面条件下的应力分布。模拟了四种不同的种植体直径(3.5毫米,4.0毫米,4.5毫米和5.0毫米)和两种基台类型(六角形和圆锥形)。根据壁厚,配合表面长度,到垂直挡块的距离以及基台形状,假定了四种独特的种植体-基台界面条件。在基台螺钉预紧期间施加轴向和斜向载荷,并在种植体-基台和基台-螺钉界面处测量Von Mises应力。植入物-基台界面应力随着壁厚的增加而减小。随着配合面的增加,应力分布趋于向下,并且当到植入物垂直止挡的距离为0μm时,Von Mises应力在垂直止挡处极高。尽管其形状不同,但基台显示出相似的应力分布。但是,圆锥形连接的最大冯·米塞斯应力高于六角形连接,特别是在负载的对侧。为了减小在种植体-基台界面处的应力分布,应仔细考虑种植体的壁厚,配合表面接触长度,到垂直止挡的距离以及基台的形状。

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