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首页> 外文期刊>Tribology letters >Atmospheric effects of friction, friction noise and wear with silicon and diamond. part III. SEM tribometry of polycrystalline diamond in vacuum and hydrogen
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Atmospheric effects of friction, friction noise and wear with silicon and diamond. part III. SEM tribometry of polycrystalline diamond in vacuum and hydrogen

机译:硅,金刚石的摩擦,摩擦噪声和磨损的大气效应。第三部分真空和氢气条件下多晶金刚石的SEM摩擦学

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摘要

In this part III of a multi-part paper series, the results of additional SEM tribometric experiments are described, performed with polished, mostly C(l00)-oriented polycrystalline CVD diamond film [PCD{sub}C(l00) vs. PCD{sub}c(100)] counterfacessliding in ~1 x l0{sup}-5 Torr and in 0.1-0.3 Torr partial pressures of pure hydrogen gas. These tests were completed under a 28 g (0.27 N) normal load, under standard and slow thermal ramping conditions at temperatures ranging from room temperature to1000°C. The friction data were examined per the computer logging and analysis techniques described in part I. The treatment of the data is similar to that of Si in part II: the maximum and the average coefficients of friction (MAX.COF and COF) and theirratios (the friction noise FN) are employed to measure possible lubricative interaction of the diamond surfaces with rarefied hydrogen. The results indicate that excited species of molecular hydrogen enter into tribothermally catalyzed reactions not onlywith Si but with PCD{sub}c(100) surfaces as well. Similar to the behavior of Si, the most beneficial friction-reducing regime occurs in a temperature range just before the thermal desorption of adsorbates. The general magnitudes of MAX.COF, COF and the FN are significantly lower than those of the Si crystallinities, in both vacuum and PH{sub}2. The wear rate of the PCD{sub}c(l00) film characteristic of the standard thermal ramping test procedure performed mostly in PH{sub}2 is around 4 x 10{sup}-16m{sup}3/(N m), in good agreement with the wear rate previously measured in vacuum for unpolished, fine-cauliflowered diamond films. The data indicate that smooth polycrystalline diamond is a significantly better bearing material for miniaturized movingmechanical assembly applications than Si.
机译:在多部分论文系列的第III部分中,描述了其他SEM摩擦学实验的结果,这些结果是通过抛光的,大多为C(100)取向的多晶CVD金刚石薄膜[PCD {sub} C(100)与PCD { sub} c(100)]的相对滑动在纯氢气的〜1 x l0 {sup} -5托和0.1-0.3托分压中滑动。这些测试是在28 g(0.27 N)的正常负载下,在室温至1000°C的温度下在标准缓慢升温条件下完成的。摩擦数据通过第一部分所述的计算机测井和分析技术进行了检查。数据的处理与第二部分中的Si相似:最大和平均摩擦系数(MAX.COF和COF)及其比值(摩擦噪声(FN)用于测量金刚石表面与稀有氢的可能润滑相互作用。结果表明,分子氢的激发物种不仅与Si而且与PCD {sub} c(100)表面也进入了摩擦热催化反应。与Si的行为相似,最有利的减小摩擦的方式是在吸附物热脱附之前的温度范围内发生。在真空和PH {sub} 2中,MAX.COF,COF和FN的一般幅度都显着低于Si结晶度。主要在PH {sub} 2中执行的标准热升温测试程序的PCD {sub} c(100)薄膜特性的磨损率约为4 x 10 {sup} -16m {sup} 3 /(N m),与先前在真空中测量的未抛光,细花椰菜金刚石薄膜的磨损率非常吻合。数据表明,光滑的多晶金刚石是用于微型移动机械组装应用的显着优于硅的轴承材料。

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