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Effect of molecularly thin lubricant on roughness and adhesion of magnetic disks intended for extremely high-density recording

机译:分子稀薄润滑剂对打算用于超高密度记录的磁盘的粗糙度和粘附力的影响

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摘要

For extremely high-density recording using conventional technologies, the fly-height needs to decrease to less than ten nanometers. To allow such operation, disk and slider surfaces must become extremely smooth, down to root-mean-square (RMS) roughness values of a few angstroms. For super-smooth disks, molecularly thin lubricants are applied to improve tribological performance of head/disk interfaces. The focus of this study is to quantify the effect of lubricant thickness in terms of detailed roughness parameters and to evaluate the effect of roughness and molecularly thin lubricant on adhesion of magnetic disks intended for extremely high-density recording. Three identical ultra-low-flying disks have been fabricated from the same batch for this particular experiment. To investigate the effect of molecularly thin lubricants on disk roughness, super-smooth magnetic disks with increasing lubricant thickness have been measured and studied, using a primary roughness parameter set. It describes amplitude, spatial, hybrid, and functional aspects of surface roughness and is used to quantify the extremely smooth disk roughness as a function of lubricant thickness. It is found that in addition to simple amplitude parameters, hybrid and functional parameters also capture small features on the disk roughness and show distinct trends with increasing lubricant thickness. Subsequently, a continuum-based adhesion model that uses three parameters from the primary roughness parameter set, is used to predict how the varying thickness of molecularly thin lubricant and the resulting disk roughness affect intermolecular forces at ultra-low-flying head-disk interfaces. It is found that a thicker lubricant layer of 2nm causes higher adhesion forces for ultra-low-flying-heights in the range of 1-3 nm.
机译:对于使用常规技术进行的极高密度记录,飞行高度需要减小到小于十纳米。为了进行这种操作,磁盘和滑块表面必须变得非常光滑,直至粗糙度达到几埃的均方根(RMS)。对于超光滑磁盘,应使用分子稀薄的润滑剂来改善磁头/磁盘界面的摩擦学性能。这项研究的重点是根据详细的粗糙度参数量化润滑剂厚度的影响,并评估粗糙度和分子稀薄的润滑剂对旨在用于超高密度记录的磁盘粘附的影响。对于该特定实验,从同一批中制造了三个相同的超低飞盘。为了研究分子稀薄的润滑剂对磁盘粗糙度的影响,使用初级粗糙度参数集对随着润滑剂厚度增加而形成的超光滑磁盘进行了测量和研究。它描述了表面粗糙度的幅度,空间,混合和功能方面,并用于量化极光滑的圆盘粗糙度与润滑剂厚度的关系。已发现,除了简单的振幅参数外,混合参数和功能参数还捕获了磁盘粗糙度的小特征,并随着润滑剂厚度的增加而显示出明显的趋势。随后,基于连续性的粘附模型使用了主要粗糙度参数集中的三个参数,用于预测分子稀薄的润滑剂厚度的变化和所产生的磁盘粗糙度如何影响超低飞头磁盘界面的分子间力。发现2nm的较厚的润滑剂层对于1-3nm范围内的超低飞行高度引起较高的粘附力。

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