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Observation of delamination wear of lubricious tribofilm formed on Si{sub}3N{sub}4 during sliding against WC-Co in humidity air

机译:观察在潮湿空气中与WC-Co滑动时在Si {sub} 3N {sub} 4上形成的润滑性摩擦膜的分层磨损

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摘要

Hot pressed silicon nitride that was exposed to high (90%) and low (32%) relative humidity was examined in ball-on-disc geometry against cemented carbide ball at various normal loads. The study indicated that Si{sub}3N{sub}4 tested at high R.H. gave less specific wear rate compared with Si{sub}3N{sub}4 at low R.H, The friction coefficient of Si{sub}3N{sub}4-WC-6% Co tribopairs was found in the range of 0.32-0.39 and 0.05-0.17 at low humidity and high humidity respectively. It is suggested that adsorbed moisture markedly affected the wear and friction properties of silicon nitride. Following the tests, SEM was used to elucidate the wear mechanism and particularly to delineate the effects of relative humidity on the wear and friction. SEM micrographs showed that the main wear mechanism at low relative humidity (32%) was caused by mechanical wear including abrasive grooves, large holes and polishing, whereas at high relative humidity (90%) the main mechanism was highly influenced by a tribochemical reaction related to the moisture adsorption from the environment. It is concluded that the removal of lubricious tribolayer was occurred by delamination induced crack propagation
机译:在不同的法向载荷下,以盘上球的几何形状针对硬质合金球检查了暴露于高(90%)和低(32%)相对湿度的热压氮化硅。研究表明,与低RH下的Si {sub} 3N {sub} 4相比,在高RH下测试的Si {sub} 3N {sub} 4的比磨损率小。Si{sub} 3N {sub} 4的摩擦系数在低湿度和高湿度下,发现-WC-6%Co摩擦对分别在0.32-0.39和0.05-0.17的范围内。建议吸附的水分明显影响氮化硅的磨损和摩擦性能。在测试之后,使用SEM阐明了磨损机理,尤其是描述了相对湿度对磨损和摩擦的影响。扫描电镜显微照片显示,相对湿度低(32%)时的主要磨损机理是由机械磨损引起的,包括磨蚀槽,大孔和抛光,而相对湿度高(90%)时,主要磨损机理受到摩擦化学反应的影响较大。从环境中吸收水分。结论是,润滑性摩擦层的去除是由于分层引起的裂纹扩展而发生的。

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