Modelling of frictional and adhesive contacts at silicon/polymer interface for nanotechnological applications

摘要

The minimisation of friction and adhesion during sliding contacts is crucial for the industrial fabrication of many microanodevices (e.g. MEMS/NEMS), as well as in nanotechnological processes, e.g. in nanoimprint lithography where a silicon mould is used to fabricate polymeric nanostructures by imprinting. We have conducted intensive research on the contact between the mould and PMMA polymeric resist film via advanced modelling and computer simulations. The properties of the contacting surfaces have been identified with the atomic force microscope and nanoindentation, as well as wettability tester applied for the identification of the surface free energy. A model of contact has been elaborated and adequate original software was used to calculate the frictional and adhesive forces in particular at the silicon mould/polymeric resist interface.