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首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >Low-energy and low-dose electron irradiation of potassium-lime-silicate glass investigated by XPS. Part II. Chemical bonding
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Low-energy and low-dose electron irradiation of potassium-lime-silicate glass investigated by XPS. Part II. Chemical bonding

机译:XPS研究了石灰硅酸钾玻璃的低能低剂量电子辐照。第二部分化学键

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摘要

XPS has been used to study changes in chemical bonding occurring in a surface region of potassium-lime-silicate glass. The surface was prepared by fracturing in ultrahigh vacuum and step-by-step irradiated with low-energy and low-dose electron beam. The modified near-surface region thickness is in this case comparable with the mean sampling depth of XPS. Therefore, possible changes due to electron irradiation could be recorded with high sensitivity. The irradiation resulted in potassium accumulation at the glass surface. As a consequence, changes in surface charging, binding energy shift, peak width (FWHM), and peak area ratios of non-bridging oxygen (NBO) and bridging oxygen (BO) contributions to the O 1s lines with electron dose were observed. Copyright (C) 2004 John Wiley Sons, Ltd.
机译:XPS已经被用于研究在石灰钙硅酸盐玻璃的表面区域中发生的化学键的变化。通过在超高真空中压裂并逐步用低能量和低剂量电子束辐照来制备表面。在这种情况下,修改后的近表面区域厚度与XPS的平均采样深度相当。因此,可以高灵敏度地记录由于电子辐照引起的可能变化。辐射导致钾在玻璃表面积聚。结果,观察到随着电子剂量,对O 1s线的表面电荷,结合能移动,峰宽(FWHM)以及非桥连氧(NBO)和桥连氧(BO)的峰面积比的变化。版权所有(C)2004 John Wiley Sons,Ltd.

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