Lower friction and higher wear resistance of fluorine-incorporated amorphous carbon films

摘要

Plasma-enhanced chemical vapor deposition was employed to fabricate hydrogenated amorphous carbon (a-C:H) films and fluorine-doped hydrogenated amorphous (a-C:H:F) carbon films. For comparison purpose, the a-C:H films were treated with CF_4 plasma. The bonding structure and tribological behavior of the films were investigated. The results indicate that the F presented mainly in the forms of C-F_3, C-F and C-F_2 groups in both the a-C:H:F film and the surface CF_4 plasma processed hydrogenated amorphous carbon (F-P-a-C:H) films. Moreover, the a-C:H:F films, because of the transformation of sp~3 to sp~2, possess a lower friction coefficient than that of the F-P-a-C:H films.