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首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >Mass spectrometric and theoretical studies on the fragmentation mechanism of protonated molecules and molecular radical cations of organometallic compounds with Si-C, Si-Si, Ge-C and Ge-Ge bonds
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Mass spectrometric and theoretical studies on the fragmentation mechanism of protonated molecules and molecular radical cations of organometallic compounds with Si-C, Si-Si, Ge-C and Ge-Ge bonds

机译:具有Si-C,Si-Si,Ge-C和Ge-Ge键的有机金属化合物的质子化分子和分子自由基阳离子的断裂机理的质谱和理论研究

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Protonated hexamethyldigermane [HMDG]H+ and protonated hexamethyldisilane [HMDS]H+ were generated in the gas phase by nanoelectrospray ionization (nano-ESI) and atmospheric pressure chemical ionization (APCI). The fragmentation mechanisms of [HMDG]H+ and [HMDS]H+ were investigated by analyzing the collision-induced dissociation (CID). In CID spectra of [HMDG]H+, the fragment ions due to a CH4 elimination from the protonated hexamethyldigermane were observed. The potential energy curves were calculated using the ab initio method (B3LYP/6-31G(2df,p)). The calculated optimal geometries of [HMDG]H+ and [HMDS]H+ were the proton-bound structures and the ion-neutral complexes. The results of ab initio calculations showed that C2H4 elimination occurred more easily than C2H6 elimination in both (CH3)(3)Ge+ and (CH3)(3)Si+. This was consistent with the experimental results of the CID spectrum of (CH3)(3)Si+. Copyright (C) 2006 John Wiley & Sons, Ltd.
机译:通过纳米电喷雾电离(nano-ESI)和大气压化学电离(APCI)在气相中生成质子化的六甲基二茂铁[HMDG] H +和质子化的六甲基二硅烷[HMDS] H +。通过分析碰撞诱导解离(CID),研究了[HMDG] H +和[HMDS] H +的断裂机理。在[HMDG] H +的CID光谱中,观察到由于CH4从质子化的六甲基二茂铁中消除而产生的碎片离子。势能曲线使用从头算方法(B3LYP / 6-31G(2df,p))计算得出。计算得出的[HMDG] H +和[HMDS] H +的最佳几何结构是质子结合结构和离子中性复合物。从头算的结果表明,在(CH3)(3)Ge +和(CH3)(3)Si +中,C2H4的消除比C2H6的消除更容易发生。这与(CH3)(3)Si +的CID光谱的实验结果一致。版权所有(C)2006 John Wiley&Sons,Ltd.

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