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首页> 外文期刊>Surface & Coatings Technology >Improvement of resistance of TiAl alloy against high temperature oxidation by electroplating in AlCl3-NaCl-KCl-CrCl2 molten salt
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Improvement of resistance of TiAl alloy against high temperature oxidation by electroplating in AlCl3-NaCl-KCl-CrCl2 molten salt

机译:通过在AlCl3-NaCl-KCl-CrCl2熔盐中进行电镀来提高TiAl合金的抗高温氧化性

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摘要

For improvement of the oxidation resistance of a TiAl alloy under high temperature conditions, aluminum chromium alloys were electroplated on the TiAl alloy in an AlCl3-NaCl-KCl molten salt containing CrCl2 at 423 K. The deposit electroplated at -0.1 V vs. Al/Al3+ consists of gamma-Al8Cr5 single phase, including chromium content at 41 at.%. A mixture phase of gamma-Al8Cr5 and Al is, however, formed at potential from - 0.2 to - 0.4 V. The oxidation resistance of the electrodeposit layer was evaluated by a high temperature oxidation test at 1173 K for 24 h. On the TiAl specimen covered with gamma-Al8Cr5 which was deposited at -0.1 V, a uniform AlCr2 layer was formed during the oxidation at 1173 K. The AlCr2 layer was covered by a thin dense Al2O3. Both AlCr2 and Al2O3 layers play a role of superior protection from the high temperature oxidation of the TiAl alloy; therefore, the plating of the gamma-Al8Cr5 single layer deposited at -0.1 V reduced oxide thickness by 1/40 during the oxidation at 1173 K for 24 h from that on the TiAl without any plating. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 22]
机译:为了改善高温条件下的TiAl合金的抗氧化性,在423 K的AlCl3-NaCl-KCl含CrCl2的熔融盐中,将铝铬合金电镀在TiAl合金上。在-0.1 V对Al /的条件下电镀沉积物Al3 +由γ-Al8Cr5单相组成,其中铬含量为41 at。%。然而,在-0.2至-0.4 V的电势下形成了γ-Al8Cr5和Al的混合相。电沉积层的抗氧化性通过1173 K在24小时的高温氧化测试中进行了评估。在以-0.1 V沉积的,被γ-Al8Cr5覆盖的TiAl样品上,在1173 K的氧化过程中形成了均匀的AlCr2层。AlCr2层被致密的薄Al2O3覆盖。 AlCr2和Al2O3层均具有出色的保护作用,可防止TiAl合金的高温氧化。因此,以-0.1 V沉积的γ-Al8Cr5单层的镀层在1173 K氧化24 h时的氧化物厚度比没有镀层的TiAl减少了1/40。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:22]

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