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首页> 外文期刊>Surface & Coatings Technology >The electrochemical polishing behavior of porous austenitic stainless steel (AISI 316L) in phosphoric-sulfuric mixed acids
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The electrochemical polishing behavior of porous austenitic stainless steel (AISI 316L) in phosphoric-sulfuric mixed acids

机译:多孔奥氏体不锈钢(AISI 316L)在磷酸-硫酸混合酸中的电化学抛光行为

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摘要

The electrochemical polishing of porous austenitic stainless steel (PASS), AISI 316L, in the phosphoric-sulfuric mixed acid with volume-ratio of 1: 1, 2: 1 and 3: 1 at temperature ranging from 60 to 80 degrees C was studied. Electrochemical polishing of PASS was performed in the potential located in the limiting-current plateau of its anodic polarization curve using a rotating cylinder electrode (RCE). The results show that the electrochemical polishing of PASS is strongly affected by the volume ratio of the mixed acid and the polishing temperature, yet very little by the potentiostatic polishing charge. An optimal brightening and leveling surface of PASS could be achieved by polishing in 2: 1 v/v mixed acid at 70 degrees C. Whereas, polishing in 1 : 1 and 2: 1 v/v ratios at and above 75 degrees C would result in formation of enlarged pores on the PASS surface due to high dissolution rate within the pores. Pores with rounded edges in the surface morphology of PASS was shown when polishing in 3: 1 v/v mixed acid at temperature ranging from 60 to 80 degrees C. The effects of temperature, acid volume-ratio as well as potentiostatic polishing charge on polishing behavior were discussed based on the results of electrochemical test and the polished surface morphology using scanning electron microscope (SEM). (c) 2005 Elsevier B.V. All rights reserved.
机译:研究了在60至80摄氏度的温度下,在体积比为1:1、2:1和3:1的磷酸-硫酸混合酸中对多孔奥氏体不锈钢(PASS)AISI 316L进行的电化学抛光。使用旋转圆柱电极(RCE)在位于其阳极极化曲线极限电流平稳区的电势中对PASS进行电化学抛光。结果表明,PASS的电化学抛光受混合酸的体积比和抛光温度的影响很大,而恒电位抛光电荷的影响很小。通过在70摄氏度下以2:1 v / v混合酸进行抛光,可以获得PASS的最佳增白和流平表面由于在孔中的高溶解速率,在PASS表面上形成了扩大的孔。当在60至80摄氏度的温度下以3:1 v / v混合酸进行抛光时,显示出PASS表面形态中具有圆形边缘的孔。温度,酸体积比以及恒电位抛光电荷对抛光的影响基于电化学测试的结果和使用扫描电子显微镜(SEM)的抛光表面形态来讨论其行为。 (c)2005 Elsevier B.V.保留所有权利。

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