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首页> 外文期刊>Chemical Physics: A Journal Devoted to Experimental and Theoretical Research Involving Problems of Both a Chemical and Physical Nature >On the mechanism of the hysteresis and offset of current-voltage characteristics of diodes based on organic materials
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On the mechanism of the hysteresis and offset of current-voltage characteristics of diodes based on organic materials

机译:基于有机材料的二极管的电流电压特性的迟滞和偏移机理

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Experimentally observed peculiar features, like hysteresis and offset of current-voltage (IV) characteristics, of Ag/copper phthalocyanine (CuPc)/ITO prototype devices are analyzed alternately in terms of bulk trapping of electronic charges, dielectric relaxation and reduction/oxidation (redox) reaction of mobile ionic species at the ITO electrode. Scanning the bias of the ITO electrode from reverse (negative) to forward voltages at rates corresponding to delays between successive current readings shorter than ≈10 s, the measured current passes through zero at significant negative potentials (offsets) before reaching zero potential. The current, however is minimal close to zero potential when the scan direction is reversed. In order to elucidate the most probable mechanism of the offset, effects of several physical parameters have been considered: density of mobile ions or deep trap levels, delay time between two successive measurements separated by a potential step △V, bulk conductivity σ(T) of the organic material and temperature T. For both the charge capture/emission at traps and the dielectric relaxation involving the capacitance C_d of a depletion region, unrealistic trap (charged defect) concentrations are needed to comply with the experiment. Oxidation of the initially reduced (neutral) species, accompanied by an irreversible homogeneous chemical reaction of the reduced species, has also been considered. Still, two consecutive voltammetric cycles provided identical results, thereby making this option questionable. The most reliable non-conflicting interpretation is the charging of a double ionic layer capacitance at the CuPc/ITO interface through the high resistance of the "neutral" bulk of CuPc. The origin of the double layer is the protonation of CuPc as a consequence of the chemical treatment of ITO prior to CuPc deposition.
机译:对Ag /铜酞菁(CuPc)/ ITO原型器件的实验观察到的特殊特征(例如磁滞和电流-电压(IV)特性的偏移)进行了交替分析,涉及电荷的整体俘获,介电弛豫和还原/氧化(氧化还原)离子在ITO电极上的反应)。以与连续的电流读数之间的延迟短于≈10s的延迟相对应的速率扫描ITO电极从反向(负)到正向电压的偏压,在达到零电势之前,测得的电流以明显的负电势(偏移)通过零。然而,当扫描方向反向时,电流几乎接近零电位。为了阐明最可能的偏移机理,已考虑了以下几个物理参数的影响:流动离子的密度或深陷阱水平,两次连续测量之间的延迟时间(以电位阶跃△V分隔),体电导率σ(T)对于陷阱处的电荷捕获/发射以及涉及耗尽区电容C_d的介电弛豫,都需要不切实际的陷阱(带电缺陷)浓度以符合实验要求。还考虑了最初还原的(中性)物种的氧化,以及还原物种的不可逆的均相化学反应。尽管如此,两个连续的伏安循环提供了相同的结果,因此使这一选择产生了疑问。最可靠的非冲突解释是通过“中性” CuPc块的高电阻在CuPc / ITO界面处对双离子层电容充电。双层的起源是由于CuPc沉积之前对ITO进行化学处理而导致的CuPc质子化。

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