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首页> 外文期刊>Surface & Coatings Technology >Microstructure, mechanical and tribological properties of CrN/W2N multilayer films deposited by DC magnetron sputtering
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Microstructure, mechanical and tribological properties of CrN/W2N multilayer films deposited by DC magnetron sputtering

机译:直流磁控溅射沉积CrN / W2N多层膜的微观结构,力学和摩擦学性能

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摘要

CrN/W2N multilayer films with various bilayer periods of 15-85 nm were deposited on high speed steel (W18Cr4V) substrates by means of DC closed field unbalanced magnetron sputtering. The morphology and microstructure of the multilayer films were investigated by scanning electron microscopy (SEM), X-ray diffraction (XRD) and high resolution transmission electron microscopy (HRTEM). The mechanical and tribological properties were evaluated using a nanoindentor, Rockwell and scratch tests and a conventional ball-on-disk tribometer, respectively. There were some transverse grains at the layer interface and the interface between the CrN and W2N layers was not so sharp owing to atom diffusion through the interface. in the bilayer period range, the microhardness, elastic modulus and adhesive strength of the CrN/W2N multilayer films increased with the decrease of bilayer period. The CrN/W2N multilayer film with a bilayer period of 15 nm showed the highest hardness (29.2 GPa), elastic modulus (376 GPa) and best adhesion strength, it also had the highest wear resistance and lowest friction coefficient.
机译:通过DC封闭场不平衡磁控溅射,将具有不同双层周期(15-85 nm)的CrN / W2N多层膜沉积在高速钢(W18Cr4V)衬底上。通过扫描电子显微镜(SEM),X射线衍射(XRD)和高分辨率透射电子显微镜(HRTEM)研究了多层膜的形貌和微观结构。分别使用纳米压头,罗克韦尔和划痕测试以及常规的圆盘摩擦计对机械和摩擦学性能进行了评估。在层界面处有一些横向晶粒,由于原子通过界面扩散,CrN和W2N层之间的界面不是那么尖锐。在双层周期范围内,CrN / W2N多层膜的显微硬度,弹性模量和粘合强度随着双层周期的减小而增加。双层周期为15 nm的CrN / W2N多层膜具有最高的硬度(29.2 GPa),弹性模量(376 GPa)和最佳的粘合强度,并且还具有最高的耐磨性和最低的摩擦系数。

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