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Characteristics of Nickel-doped Zinc Oxide thin films prepared by sol-gel method

机译:溶胶-凝胶法制备镍掺杂氧化锌薄膜的特性

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Transparent and conductive high preferential c-axis oriented Ni-doped ZnO (NZO) thin films as a function of Ni content have been prepared by sol-gel method using zinc acetate and nickel acetate as starting material, anhydrous ethanol and 2-methodxyethanol as solvent. The NZO thin films with a dopant ratio (0.2, and 0.4 mol%) have a preferred orientation in the (002) direction. However, when the Ni doping ratio exceeds 0.6 mol% films possessed a non-textured polycrystalline structure. The electric and optical properties of the Ni doped ZnO films were found to be strongly dependent on the Ni contents. The lowest resistivity value was 4.8x10(-4) Omega cm, which was obtained in the 0.2 mol% Ni-doped ZnO thin film. The improvement of the electrical and optical properties of NZO films may be related to the both increase in the concentration of oxygen vacancies and free carries of Ni ions. The average optical transmittance values of the 0.2 mol% Ni-doped NZO thin films were more than 91.2% in the visible range.
机译:以乙酸锌和乙酸镍为起始原料,以无水乙醇和2-甲基二乙醇为溶剂,通过溶胶-凝胶法制备了透明导电的高优先c轴取向Ni掺杂ZnO(NZO)薄膜,其含量与Ni含量有关。 。具有掺杂剂比率(0.2和0.4mol%)的NZO薄膜在(002)方向上具有优选的取向。但是,当Ni掺杂率超过0.6摩尔%时,膜具有非织构的多晶结构。发现掺Ni的ZnO膜的电学和光学性质强烈依赖于Ni含量。最低的电阻率为4.8x10(-4)Ωcm,该电阻率是在0.2 mol%的Ni掺杂的ZnO薄膜中获得的。 NZO膜的电学和光学性质的改善可能与氧空位浓度的增加和Ni离子的自由携带有关。在可见光范围内,掺有0.2mol%Ni的NZO薄膜的平均透光率大于91.2%。

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