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CrB2 coatings deposited by inductively coupled plasma assisted DC magnetron sputtering

机译:电感耦合等离子体辅助直流磁控溅射沉积的CrB2涂层

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CrB2 coatings were synthesized on high speed steel (HSS) substrates using inductively coupled plasma (ICP) assisted DC magnetron sputtering, and the structure and properties of the CrB2 coating produced at different ICP powers and substrate biases were investigated. The hardness of the CrB2 coatings increased from 30 GPa to 54 GPa by increasing the ICP power as well as the negative substrate bias. By increasing ICP power, the preferred orientation of the CrB2 coating changed from (101) to (001). The CrB2 coating showed excellent corrosion resistance. The corrosion resistance of the CrB2 coatings was also found to be much better than that of the TiB2 coatings. The adhesion strength of the film could be improved considerably after ICP nitriding of the substrate. (c) 2007 Elsevier B.V. All rights reserved.
机译:利用感应耦合等离子体(ICP)辅助直流磁控溅射在高速钢(HSS)衬底上合成CrB2涂层,并研究了在不同ICP功率和衬底偏压下产生的CrB2涂层的结构和性能。 CrB2涂层的硬度通过增加ICP功率以及负的基材偏压而从30 GPa增加到54 GPa。通过增加ICP功率,CrB2涂层的首选取向从(101)变为(001)。 CrB2涂层显示出优异的耐腐蚀性。还发现CrB2涂层的耐蚀性比TiB2涂层要好得多。在对基材进行ICP氮化后,可以大大提高薄膜的粘附强度。 (c)2007 Elsevier B.V.保留所有权利。

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