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Corrosion behaviour of electrodeposited and sputtered Cr coatings and sputtered Ta coatings with alpha and beta phases

机译:电沉积和溅射Cr涂层以及具有α和β相的溅射Ta涂层的腐蚀行为

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摘要

The corrosion behaviour of alpha- and beta-Ta coatings was compared to that of Cr coatings produced by cylindrical magnetron sputtering as well as electrodeposition. For Ta coatings, the corrosion process was dominated by dissolution of the steel substrate through open pores, however, at the end of 5 days, coating degradation was not observed. In contrast, while open pores were not observed with the Cr coatings, the corrosion resistance decreased as a function of time under acidic conditions, as a result of the protective oxide dissolution. Initially, however, the sputtered Cr coating exhibited improved corrosion resistance over the electrodeposited one, potentially due to the surface structure of the oxide film. Both Cr coatings showed similar transpassive behaviour to that of pure Cr; the current density of the sputtered Cr coating was observed to be greater than that of the electrodeposited one in the transpassive region due to the extensive droplet-like defects. (c) 2005 Elsevier B.V. All rights reserved.
机译:将α-和β-Ta涂层的腐蚀行为与通过圆柱形磁控溅射以及电沉积生产的Cr涂层的腐蚀行为进行了比较。对于Ta涂层,腐蚀过程主要是通过开放的孔使钢基材溶解,但是在5天结束时,未观察到涂层降解。相反,尽管在Cr涂层中未观察到开孔,但由于保护性氧化物的溶解,在酸性条件下,耐腐蚀性随时间的变化而降低。然而,起初,溅射的Cr涂层比电沉积的Cr涂层表现出更高的耐腐蚀性,这可能是由于氧化膜的表面结构所致。两种Cr涂层均表现出与纯Cr相似的穿透性行为。由于广泛的液滴状缺陷,溅射的Cr涂层的电流密度被观察到大于电沉积的Cr的电流密度。 (c)2005 Elsevier B.V.保留所有权利。

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