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Application of optical transmission interferometry for in-situ structural investigations of titanium dioxide sputter-deposited coatings

机译:光学透射干涉法在二氧化钛溅射沉积涂层原位结构研究中的应用

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摘要

Titanium dioxide coatings (from 0.1 to 1.5 mu m thick) have been dc sputter-deposited on glass slides from titanium targets in various Ar-O-2 reactive gas mixtures. Deposition rate and optical properties were controlled in-situ by optical transmission interferometry (OTI) with an optical fibre located behind the glass substrate in order to perform a real-time control of transmittance of the growing film. Thus, it is possible to determine in-situ the optical indices (n, k) and the thickness of the as-deposited film by using a simple simulation, developed on Matlab software. The optical properties of the films were investigated in relation to their structure, which depends on the sputtering conditions adopted. In particular, the effects of the sputtering pressure (working pressure and oxygen partial pressure), the discharge power and the substrate location into the reactor are investigated in detail. Films structure is assessed by standard grazing incidence X-ray diffraction (XRD). (c) 2006 Elsevier B.V. All rights reserved.
机译:二氧化钛涂层(厚度从0.1到1.5微米)已通过直流溅射法从钛靶材在各种Ar-O-2反应性气体混合物中溅射沉积到玻璃载片上。为了对生长膜的透射率进行实时控制,通过位于玻璃基板后方的光纤通过光透射干涉法(OTI)原位控制沉积速率和光学性能。因此,有可能通过使用在Matlab软件上开发的简单模拟来原位确定光学指数(n,k)和沉积薄膜的厚度。研究了薄膜的光学性能及其结构,这取决于所采用的溅射条件。特别是,详细研究了溅射压力(工作压力和氧分压),放电功率和基材在反应器中的位置的影响。通过标准掠入射X射线衍射(XRD)评估膜结构。 (c)2006 Elsevier B.V.保留所有权利。

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