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Tin plating in acid Sn(II) gluconate solutions containing excess of sulphate

机译:含有过量硫酸盐的酸性葡萄糖酸Sn(II)溶液中的镀锡

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摘要

Voltammetry, electrochemical impedance spectroscopy, SEM and XRD techniques were applied to study tin plating in acid 0.01M Sn(II) solutions containing different amounts (0.02-0.1M) of gluconate and 0.5M Na_2SO_4. Solution pH is the main factor that governs the rate of Sn(II) reduction. An increase in pH from 2 to 5 results in a 100-fold growth in electrode impedance and a four-fold reduction in limiting current density. Spongy tin deposits are obtained in the ligand insufficient solutions at low cathodic polarisations ΔE. To obtain compact fine grained tin coatings, ΔE and/or the gluconate concentration should be correspondingly increased. Sn(II) reduction proceeds under conditions of strong inhibition involving destructive ligand chemisorption and incorporation of its fragments into deposits.
机译:伏安法,电化学阻抗谱,SEM和XRD技术被用于研究在0.01M Sn(II)酸溶液中的镀锡,该溶液含有不同量(0.02-0.1M)的葡萄糖酸盐和0.5M Na_2SO_4。溶液的pH值是控制Sn(II)还原速率的主要因素。 pH从2增加到5导致电极阻抗增加100倍,极限电流密度降低4倍。在低阴极极化ΔE下,在配体不足的溶液中获得海绵状锡沉积物。为了获得致密的细晶粒锡涂层,应相应增加ΔE和/或葡萄糖酸盐的浓度。 Sn(II)还原是在强烈抑制条件下进行的,该条件涉及破坏性配体化学吸附并将其片段掺入沉积物中。

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