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Effect of substrate temperature on optical, structural and electrical properties of FeSe thin films deposited by spray pyrolysis technique

机译:基材温度对喷雾热解沉积FeSe薄膜的光学,结构和电性能的影响

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摘要

The versatile spray pyrolysis technique was employed to prepare thin films of iron selenide on glass substrates at different substrate temperatures. The deposition temperature was varied between 473 and 673 K. The as-deposited films were characterized by X-ray diffraction (XRD), SEM, optical and electrical characterization techniques. The X-ray studies reveal that the films are nanocrystalline with tetragonal structure and exhibit (101) preferred orientation. The SEM and AFM studies indicate that the film surface is homogenous with no cracks or pinholes and well covers the glass substrate. The film thickness was found to vary from 110 to 230 nm with substrate temperature. The optical band gap was found to decrease from 2.92 to 2.68 eV depending on deposition temperature. The resistivity of p-type FeSe film is of the order of 8×10~4 Ω cm and it decreases to 1.5×10~4 Ω cm as substrate temperature is increased from 473 K to 673 K.
机译:采用通用的喷雾热解技术在不同的基板温度下在玻璃基板上制备硒化铁薄膜。沉积温度在473至673 K之间变化。沉积的薄膜通过X射线衍射(XRD),SEM,光学和电学表征技术进行表征。 X射线研究表明该薄膜是具有四方结构的纳米晶体,并表现出(101)较好的取向。 SEM和AFM研究表明,薄膜表面均匀,没有裂纹或针孔,并且覆盖了玻璃基板。发现膜厚度随基材温度在110至230nm之间变化。发现光学带隙根据沉积温度从2.92eV降低到2.68eV。 p型FeSe薄膜的电阻率约为8×10〜4Ωcm,并且随着基板温度从473 K升高到673 K降低到1.5×10〜4Ωcm。

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