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首页> 外文期刊>The journal of physics and chemistry of solids >Electronic structure of BN nanotubes with intrinsic defects NB and BN and isoelectronic substitutional impurities PN, AsN, SbN, InB, GaB, and AlB
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Electronic structure of BN nanotubes with intrinsic defects NB and BN and isoelectronic substitutional impurities PN, AsN, SbN, InB, GaB, and AlB

机译:具有固有缺陷NB和BN以及等电取代杂质PN,AsN,SbN,InB,GaB和AlB的BN纳米管的电子结构

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摘要

The effect of intrinsic defects and isoelectronic substitutional impurities on the electronic structure of boron-nitride (BN) nanotubes is investigated using a linearized augmented cylindrical wave method and the local density functional and muffin-tin approximations for the electron potential. In this method, the electronic spectrum of a system is governed by a free movement of electrons in the interatomic space between cylindrical barriers and by a scattering of electrons from the atomic centers. Nanotubes with extended defects of substitution NB of a boron atom by a nitrogen atom and, vice versa, nitrogen by boron BN with one defect per one, two, and three unit cells are considered. It is shown that the presence of such defects significantly affects the band structure of the BN nanotubes. A defect band p(B, N) is formed in the optical gap, which reduces the width of the gap. The presence of impurities also affects the valence band: the widths of s, sp, and pp bands change and the gap between s and sp bands is partially filled. A partial substitution of the N by P atoms leads to a decrease in the energy gap, to a separation of the Ds(P) band from the high-energy region of the s(B, N) band, as well as to the formation of the impurity Dp(P) and Dp*(P) bands, which form the valence-band top and conduction-band bottom in the doped system. The influence of partial substitution of N atoms by the As atom on the electronic structure of BN nanotubes is qualitatively similar to the case of phosphorus, but the optical gap becomes smaller. The optical gap of the BN tubule is virtually closed due to the effect of one Sb atom impurity per translational unit cell, in contrast to the weak indium-induced perturbation of the band structure of the BN nanotube. Introduction of the one In, Ga or Al atom per three unit cells of the (5, 5) BN nanotube results in 0.6 eV increase of the optical gap. The above effects can be detected by optical and photoelectron spectroscopy methods, as well as by measuring electrical properties of the pure and doped BN nanotubes. They can be used to design electronic devices based on BN nanotubes.
机译:使用线性化增强圆柱波方法以及电子势的局部密度泛函和松饼锡近似,研究了固有缺陷和等电取代杂质对氮化硼(BN)纳米管电子结构的影响。在这种方法中,系统的电子光谱受电子在圆柱形势垒之间的原子间空间中的自由运动以及电子从原子中心的散射控制。认为纳米管具有被氮原子取代硼原子的NB缺陷扩展的纳米管,反之亦然,每一个,两个和三个晶胞具有一个缺陷的氮被硼BN取代。结果表明,此类缺陷的存在会显着影响BN纳米管的能带结构。缺陷带p(B,N)形成在光学间隙中,这减小了间隙的宽度。杂质的存在也会影响价带:s,sp和pp带的宽度发生变化,并且s和sp带之间的间隙被部分填充。 N被P原子部分取代会导致能隙减小,导致Ds(P)谱带与s(B,N)谱带的高能区域分离以及形成杂质Dp(P)和Dp *(P)的谱带,形成了掺杂系统中的价带顶部和导带底部。从本质上讲,As原子取代N原子对BN纳米管电子结构的影响与磷的情况相似,但光隙变小。 BN小管的光学间隙实际上是由于每个翻译晶胞中一种Sb原子杂质的作用而被封闭的,这与铟引起的BN纳米管能带结构的微扰相反。 (5,5)BN纳米管的每三个晶胞引入一个In,Ga或Al原子会导致光学间隙增加0.6 eV。可以通过光学和光电子光谱法以及通过测量纯的和掺杂的BN纳米管的电性能来检测上述效果。它们可用于设计基于BN纳米管的电子设备。

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